Vacuum Coating Systems

Vacuum coating systems utilize evaporation, magnetron sputtering, PECVD, and IBS to deposit thin films onto a substrate, creating optical, electronic, and protective coatings.

Product	Coating Area	Deposition Technology	Substrate Materials	Availability	Price (USD)
Ion Beam Sputtering	440 mm (1520 x 7 cm², Planetary) 210 mm (2420 cm², Planetary)	IBS	Chromatic and Achromatic Optical Glass Sapphire Glass Ceramics Quartz Potassium fluoride	Contact Supplier	Add to cart to request quote
Product Code Coating Area 440 mm (1520 x 7 cm², Planetary) 210 mm (2420 cm², Planetary) Deposition Technology IBS Substrate Materials Chromatic and Achromatic Optical Glass Sapphire Glass Ceramics Quartz Potassium fluoride Applications Beam Splitters Laser Gyroscope Laser Optics Medical Equipment and Measurement Devices Optical Filters Sputtering Targets Al, Hf, Nb, SiO₂, Ta, Ti, Zr Coating Rate < 0.4 nm/s (Material Dependent) Coating Thickness Uniformity < ±0.25%, ±0.5% (210 mm, 440 mm) Dimensions 3490 x 2730 x 2460 mm Process Temperature < 100 °C Weight 5500 kg Holder Single disk Ø440 mm (area 1520 cm 2 ) Planetary 7x Ø 210 mm (area 2420 cm 2 ) Other planetary by request Pressure 0.0008 Pa (Start Pressure) 5 × 10^-5 Pa (Ultimate Pressure) Number of Targets 4 Pumping System Dry mechanical pump & cryogenic pump Turbo molecular pump (optional) Supplier Location Lithuania See product details More from I-Photonics
Magnetron sputtering	800 x 1100 mm (GEN 4.5)	Magnetron Sputtering RF Plasma	Glass, Plastic, PET, Other Material by Request	Contact Supplier	Add to cart to request quote
Product Code Coating Area 800 x 1100 mm (GEN 4.5) Deposition Technology Magnetron Sputtering RF Plasma Substrate Materials Glass, Plastic, PET, Other Material by Request Cleaning System Ion Beam, RF Plasma Key Features Zero Gap Transport System Design Shortest Cycle Time 45 s Supplier Location Lithuania See product details More from I-Photonics
Magnetron sputtering	300 mm (Maximum)	Magnetron Sputtering	-	Contact Supplier	Add to cart to request quote
Product Code Coating Area 300 mm (Maximum) Deposition Technology Magnetron Sputtering Cleaning System RF Plasma Key Features Mounting of Different Substrate Sizes Sputter-Up Configuration Applications Beam Splitters Laser Optics Optical Coatings Optical Filters Ultra Narrow Band Pass Filters Sputtering Targets Al₂O₃ HfO₂ Nb₂O₅ SiO₂ Ta₂O₅ Coating Rate < 0.6 nm/s (Material Dependent) Coating Thickness Uniformity < ±0.2% Dimensions 3790 x 3560 x 2450 mm Process Temperature < 250 °C Weight 3400 kg Workpiece Dimensions 200 x 250 x 300 mm Assisting Source RF plasma source Copra DN250 CCR Pressure 0.0008 Pa (Ultimate Pressure) Time to Reach Start Process 45 min Pumping System Dry mechanical pump Turbomolecular pumps Type of Substrate Holder Double Rotation Planetary Supplier Location Lithuania See product details More from I-Photonics
Magnetron sputtering	650 x 1200 mm (GEN 4.5) 1100 x 1300 mm (GEN 5)	Magnetron Sputtering RF Plasma	Glass, Plastic, PET, Other Material by Request	Contact Supplier	Add to cart to request quote
Product Code Coating Area 650 x 1200 mm (GEN 4.5) 1100 x 1300 mm (GEN 5) Deposition Technology Magnetron Sputtering RF Plasma Substrate Materials Glass, Plastic, PET, Other Material by Request Cleaning System Ion Beam, RF Plasma Key Features Zero Gap Transport System Design Shortest Cycle Time 45 s Supplier Location Lithuania See product details More from I-Photonics
Ion Beam Sputtering	320 mm (800 x 4 cm², Planetary) 210 mm (1380 cm², Planetary) 320 mm (2400 cm²)	IBS	Chromatic and Achromatic Optical Glass Sapphire Glass Ceramics Quartz Potassium fluoride	Contact Supplier	Add to cart to request quote
Product Code Coating Area 320 mm (800 x 4 cm², Planetary) 210 mm (1380 cm², Planetary) 320 mm (2400 cm²) Deposition Technology IBS Substrate Materials Chromatic and Achromatic Optical Glass Sapphire Glass Ceramics Quartz Potassium fluoride Applications Beam Splitters Laser Optics Optical Filters Sputtering Targets Al, Hf, Nb, SiO₂, Ta, Ti, Zr Coating Rate < 0.5 nm/s (Material Dependent) Coating Thickness Uniformity < ±0.25%, ±0.5% (210 mm, 320 mm, 2400 cm²) Dimensions 3540 x 1840 x 2000 mm Process Temperature < 100 °C Weight 4500 kg Holder Single disk Ø320 mm (area 800 cm 2 ) Planetary 4x Ø 210 mm (area 1380 cm 2 ) and planetary 3×Ø320 mm (area 2400 cm 2 ) Pressure 0.0008 Pa (Start Pressure) 2 × 10^-5 Pa (Ultimate Pressure) Number of Targets 4 Pumping System Dry mechanical pump & cryogenic pump Turbo molecular pump (optional) Type of Substrate Holder Planetary, Single Disk Supplier Location Lithuania See product details More from I-Photonics
Magnetron sputtering	370 x 420 mm (GEN 2)	Magnetron Sputtering RF Plasma	Glass, Plastic, PET, Other Material by Request	Contact Supplier	Add to cart to request quote
Product Code Coating Area 370 x 420 mm (GEN 2) Deposition Technology Magnetron Sputtering RF Plasma Substrate Materials Glass, Plastic, PET, Other Material by Request Cleaning System Ion Beam, RF Plasma Supplier Location Lithuania See product details More from I-Photonics
Magnetron sputtering	1100 x 1300 mm (GEN 5) 1500 x 1850 mm (GEN 6) 2200 x 2500 mm (GEN 8)	Magnetron Sputtering RF Plasma	Glass, Plastic, PET, Other Material by Request	Contact Supplier	Add to cart to request quote
Product Code Coating Area 1100 x 1300 mm (GEN 5) 1500 x 1850 mm (GEN 6) 2200 x 2500 mm (GEN 8) Deposition Technology Magnetron Sputtering RF Plasma Substrate Materials Glass, Plastic, PET, Other Material by Request Cleaning System Ion Beam, RF Plasma Key Features Zero Gap Transport System Design Shortest Cycle Time 45 s Supplier Location Lithuania See product details More from I-Photonics